The spin-coating Alpelisib in vivo process was done dropping 0.2 ml of solution on the cleaned substrate and rotating it at 3,000 rpm. Then, heat

treatment www.selleckchem.com/products/4egi-1.html at 80°C was necessary to evaporate the organic component from the layer. ZnO sputtered on ITO The second ZnO nucleant layer was prepared by DC sputtering process on the same ITO substrate described in the section ‘ZnO spin coated on ITO’ from a ZnO target of 99.999% purity. A homemade sputtering system with a power of 100 W, 2 × 10−2 mbar of Ar pressure, and a substrate temperature of 300°C was used. The layer obtained has 60-nm thickness and a stable wurtzite crystalline structure. Growth of ZnO nanorods on three different substrates ZnO nanorods were obtained by electrochemistry technique in a classical three-electrode electrochemical cell, with the spin-coated ZnO films, sputtered ZnO films, or ITO substrates as the working electrode. A platinum sheet and Ag/AgCl (3 M KCl) were used as auxiliary and reference selleck chemicals electrodes, respectively.

The electrolyte used was 5 × 10−3 M ZnCl2 (RG) and 0.1 M KCl (RG) solution with O2 saturation working at 70°C during the whole electrodeposition process. The experiments were carried out in an Autolab PGSTAT302N potentiostat (Metrohm, Utrecht, The Netherlands) with an ADC 10M card for ultrafast measurement acquisition (one sample

every 10 ns). The electrochemical experiments were performed potentiostatically for 10 min, galvanostatically for 10 min, and by pulsed current at a frequency of 0.5 Hz for 20 min, for each of the substrates. The optimal potential for each substrate was chosen by means of a check cyclic voltammetry curve with the same variable process of 0.1 V/s. As an example, a current–voltage study performed under these conditions for the ITO substrate is shown in Figure 1. Two different stages on the deposition branches can be distinguished, corresponding to the dominant reactions: Figure 1 Linear voltammetry curve. ZnCl2 5 × 10−3 M and 0.1 M KCl at 70°C on ITO substrate at 0.1 V/s. Reaction A: Zn+2 + 0.5 O2 + H2O→ 2e − + Zn(OH)n Reaction B: Zn+2 + 0.5 O2→ 2e − + ZnO Table 1 shows the electrochemical parameters applied for the potentiostatic, galvanostatic, and pulsed-current growth of the ZnO process for each nucleant layer. Table 1 Electrochemical parameters for each nucleant layer used Nucleant layer Potentiostatic Galvanostatic Pulsed current E (V) Time (s) I (mA) Time (s) I (mA) t ON (s) t OFF (s) Time (s) ITO −1 600 −4 600 −4 1 1 1,200 Spin-coated ZnO −1 600 −1.75 600 −1.75 1 1 1,200 Sputtered ZnO −0.8 600 −1.5 600 −1.